JPH0568559B2 - - Google Patents

Info

Publication number
JPH0568559B2
JPH0568559B2 JP60254799A JP25479985A JPH0568559B2 JP H0568559 B2 JPH0568559 B2 JP H0568559B2 JP 60254799 A JP60254799 A JP 60254799A JP 25479985 A JP25479985 A JP 25479985A JP H0568559 B2 JPH0568559 B2 JP H0568559B2
Authority
JP
Japan
Prior art keywords
plating
anode
wafers
pair
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60254799A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62116800A (ja
Inventor
Seiichi Ichihara
Keiji Myamoto
Hiroaki Okudaira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Microcomputer System Ltd
Hitachi Ltd
Original Assignee
Hitachi Microcomputer System Ltd
Hitachi Ltd
Hitachi Microcomputer Engineering Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Microcomputer System Ltd, Hitachi Ltd, Hitachi Microcomputer Engineering Ltd filed Critical Hitachi Microcomputer System Ltd
Priority to JP25479985A priority Critical patent/JPS62116800A/ja
Publication of JPS62116800A publication Critical patent/JPS62116800A/ja
Publication of JPH0568559B2 publication Critical patent/JPH0568559B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing the conductive pattern
    • H05K3/241Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Wiring (AREA)
JP25479985A 1985-11-15 1985-11-15 めつき装置 Granted JPS62116800A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25479985A JPS62116800A (ja) 1985-11-15 1985-11-15 めつき装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25479985A JPS62116800A (ja) 1985-11-15 1985-11-15 めつき装置

Publications (2)

Publication Number Publication Date
JPS62116800A JPS62116800A (ja) 1987-05-28
JPH0568559B2 true JPH0568559B2 (en]) 1993-09-29

Family

ID=17270052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25479985A Granted JPS62116800A (ja) 1985-11-15 1985-11-15 めつき装置

Country Status (1)

Country Link
JP (1) JPS62116800A (en])

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7098220B1 (ja) * 2022-04-14 2022-07-11 株式会社日立パワーソリューションズ めっき装置およびめっき方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55119199A (en) * 1979-03-07 1980-09-12 Ngk Insulators Ltd Surface treatment apparatus for metal, etc.

Also Published As

Publication number Publication date
JPS62116800A (ja) 1987-05-28

Similar Documents

Publication Publication Date Title
JP2873954B2 (ja) チップサイズ半導体パッケージの製造方法
JP4112615B2 (ja) C4マイクロバンプ、tabマイクロバンプおよび超大規模相互接続の電解めっき用たわみ性連続カソード接点回路
KR910006974B1 (ko) 반도체장치의 제조방법 및 그 제조장치
JP3352352B2 (ja) めっき装置、めっき方法およびバンプの形成方法
KR100329454B1 (ko) 기판상에재료층을증착하는공정및도금시스템
KR20010014064A (ko) 단일 반도체 기판의 페이스업 처리용 전기화학 증착 셀
JPS58182823A (ja) 半導体ウエハ−のメツキ装置
SG175042A1 (en) Method for manufacturing substrate for semiconductor element, and semiconductor device
JPH0568559B2 (en])
JP3980809B2 (ja) 電解処理装置
JP2882416B2 (ja) 電解めっきによる金属素子の形成方法
JP2002343851A (ja) めっき用ウェハ治具
JPH11163015A (ja) メッキ装置
JPS5828829A (ja) 半導体ウエハ−のメツキ装置
JP3400278B2 (ja) 半導体製造装置及び半導体装置の製造方法
US20240218519A1 (en) Electroless plating with a floating potential
US20060163058A1 (en) Apparatus for plating a semiconductor wafer and plating solution bath used therein
KR100454505B1 (ko) 경사형 전극링을 갖는 전기 도금 장치
JP3152713B2 (ja) 半導体装置の電解メッキ方法
JPH0580141B2 (en])
JPH01166542A (ja) 半導体装置の製造方法
JPH0744025Y2 (ja) リードの半田メッキ装置
JPS6241320B2 (en])
JP2005330567A (ja) 基板めっき方法及び基板めっき装置
JPS5934240B2 (ja) めつき装置